Students, Keleher Present at International CMP Symposium

Lewis University Students, Dr. Keleher Present at the 25th International Symposium on CMP

Published: August 21, 2023.

Lewis University’s Chemistry Department continues to showcase its academic excellence and cutting-edge research as its students and faculty participated in the 25th International Symposium on Chemical-Mechanical Planarization (CMP), hosted by Clarkson University's Center for Advanced Materials Processing (CAMP) from August 6-9 in Lake Placid, New York. 

Dr. Jason J. Keleher, the professor and chair of the Department of Chemistry at Lewis University, presented "The 'PER'-fect Storm: Exploring Complex-Assisted Redox Chemistries for Enhanced SiC CMP Performance."  

Highlighting the remarkable contributions of Lewis University's budding researchers, several students from the Keleher Research Group showcased their work through a series of presentations that captured the attention of the symposium attendees. The presentations included: 

  • Kevin Reyes, in collaboration with Nicole Courtenay and Ulysses Flores, delivered a presentation on "Developing an Amine-Based Chemistry for Shallow Trench Isolation Post-CMP Cleaning." Their collaborative effort demonstrated the synergy of a multidisciplinary approach to research. 

  • Tatiana Cahue, along with Kiana Cahue, Ara Philipossian, and Yasa Sampurno from Araca Inc., presented "Stimuli-Responsive Chemistry for Cu Enhanced Chemical Mechanical Planarization (CMP) Performance," a display of real-world applications and industry partnerships. 

  • Adam Caridi, working alongside Joseph Powell and Piper Smith, in collaboration with Prosys Inc., shared insights into "Utilizing Megasonic Energy to Induce Chemically Active Low Shear Environments for Silicon Carbide (SiC) Cleaning." Their work explored innovative methods for advanced materials processing. 

  • Joseph Powell, joined by Heather Kamuda, as well as Ara Philipossian and Yasa Sampurno from Araca Inc., presented on "Alternative Chemistries for SiC-CMP Slurry Formulations." This presentation explored alternative approaches to chemical-mechanical planarization. 

The symposium provided a platform for Lewis University's researchers to exchange ideas, foster collaborations, and showcase the students’ pioneering research in chemical-mechanical planarization.  

Lewis University is an innovative Catholic university offering market-relevant undergraduate and graduate programs to 6,500 students. Sponsored by the De La Salle Christian Brothers, Lewis University is nationally recognized for preparing intellectually engaged, ethically grounded, and globally-connected graduates who impact the world for the better. Visit www.lewisu.edu for further information.



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